Opening this fall on September 20th until April 26th, the Chinese American Museum of Chicago (CAMOC) is excited to present Ruyell Ho and Li Lin Lee: Language of Abstraction featuring selected work by two artists of Chinese descent born in Asia now living in Chicago whose studio practice since the Seventies explore abstraction to directly and indirectly re-envision language visually.
In a city known for its own brand of Surrealist and Pop Art-influenced figuration, both continue to forge separate but parallel paths, doggedly creating their own lexicon centered on the form, structure, and mechanics that is the “body” of the written as ideogrammic and calligraphic over the past fifty years.
